Lithography equipment

Details Lithography equipment Lithography equipment

2006-08-01

2006-08-01

Rutledge, D. (Department: 2851)

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

C414S940000

Reexamination Certificate

active

07083338

ABSTRACT:
A lithography equipment is provided, which includes: a coater coating a substrate with resist; a first buffer storing the substrate supplied from the coater; a baker baking the substrate supplied from the first buffer; a first turn table rotating the substrate supplied from the baker; a first transferor communicating the substrate with the coater, the first buffer, the baker, and the first turntable; an exposer exposing light to the substrate supplied from the first turntable; a developer developing the resist on the substrate supplied from the exposer; and a second transferor communicating the substrate with the first turntable, the exposer, and the developer.

REFERENCES:
patent: 5730574 (1998-03-01), Adachi et al.
patent: 6454472 (2002-09-01), Kim et al.
patent: 2002/0009902 (2002-01-01), Hashiguchi et al.
patent: 2005/0287821 (2005-12-01), Higashi et al.

Affiliated with

Also associated with

Rating

Lithography equipment does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Lithography equipment, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithography equipment will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3617912