Lithography apparatus and method employing non-environmental...

Details Lithography apparatus and method employing non-environmental... Lithography apparatus and method employing non-environmental...

2006-05-09

2006-05-09

Bahta, Kidest (Department: 2125)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

C700S182000, C430S030000

Reexamination Certificate

active

07043327

ABSTRACT:
A lithographic apparatus for forming a patterned resist layer and a method for forming a microelectronic product both employ a lithographic exposure tool controller designed to: (1) receive input data for at least one non-environmental variable that influences an exposure dose when forming a patterned resist layer from a blanket resist layer while employing a lithographic exposure tool; and (2) determine the exposure dose for forming the patterned resist layer from the blanket resist layer while employing the input data. The apparatus and method provide for forming the microelectronic product with enhanced dimensional control.

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Abstract of GB807574, Process for the production of electrolytic copper coatings, Dec. 20, 2003, pp. 5-6.
Abstract of GB827817, Improvements in or relating to electroplating copper, Dec. 27, 2003.

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