Etching a substrate: processes – Etching of semiconductor material to produce an article...
Patent
1994-05-18
1996-10-15
Powell, William
Etching a substrate: processes
Etching of semiconductor material to produce an article...
1566331, 1566441, 216 27, 216 33, 216 56, B44C 122
Patent
active
055651135
ABSTRACT:
A material deposition head having lithographically defined ejector units. Beneficially, each ejector unit includes a plurality of lithographically defined droplet ejectors. Furthermore, methods of fabricating such lithographically defined material deposition heads are also described.
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Elrod Scott A.
Hadimioglu Babur B.
Lim Martin
Quate Calvin F.
Rawson Eric G.
Powell William
Xerox Corporation
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