Lithographic system, method for adapting transmission...

Details Lithographic system, method for adapting transmission... Lithographic system, method for adapting transmission...

2008-05-06

2008-05-06

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S067000

Reexamination Certificate

active

07369216

ABSTRACT:
A lithographic system includes a radiation system configured to provide a beam of radiation; an illumination system configured to condition the beam of radiation; a support configured to support a patterning device, the patterning device configured to impart the projection beam with a pattern in its cross-section; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; and transmission adaptor arranged along an optical pathway. The radiation system includes a source configured to generate a beam of radiation. The transmission adaptor adapts an intensity profile as a function of wavelength of the beam of radiation and/or the patterned beam in such a way that the intensity profile equals a predetermined intensity profile.

REFERENCES:
patent: 6404499 (2002-06-01), Stoeldraijer et al.
patent: 6501534 (2002-12-01), Singh et al.
patent: 6563567 (2003-05-01), Komatsuda et al.
patent: 7030958 (2006-04-01), Luijkx et al.
patent: 2005/0006605 (2005-01-01), Won et al.

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