Lithographic system mask inspection device

Details Lithographic system mask inspection device Lithographic system mask inspection device

1986-05-19

1988-03-29

Howell, Janice A.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 58, 2504911, 2504922, G21K 510

Patent

active

047349239

ABSTRACT:
A device used to test the features of a mask used in a semiconductor lithographic machine. The device includes an array of charge couple devices and an array of pinholes positioned above the charge couple devices. The array of pinholes includes a small pinhole opening for each of the charge couple devices in that array and the size of each opening is dependent upon the resolution of the mask features desired to be inspected. The array of pinholes and the array of charge couple devices are moved in unison in discrete steps, related to the size of the pinhole openings, across an area of the mask related to the center to center spacing of the charge couple devices of the charge couple device array. By reading the data of each of the charge couple devices after each step, a comparison can be made against data previously obtained from a known good mask and a determination can be made whether the mask under test is acceptable or flawed.

REFERENCES:
patent: 3745358 (1973-07-01), Firtz et al.
patent: 4559603 (1985-12-01), Yoshikawa

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