Lithographic semiconductor manufacturing using a...

Details Lithographic semiconductor manufacturing using a... Lithographic semiconductor manufacturing using a...

2007-06-12

2007-06-12

Duda, Kathleen (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S394000

Reexamination Certificate

active

10710023

ABSTRACT:
Multilayer resist systems and techniques used for liftoff or planarizing topography wherein the dimensions and thicknesses of the layers are independently controlled. The undercut may also be independently controlled for precision structures.

REFERENCES:
patent: 4204009 (1980-05-01), Feng et al.
patent: 4212935 (1980-07-01), Canavello et al.
patent: 4533624 (1985-08-01), Sheppard
patent: 4645562 (1987-02-01), Liao et al.
patent: 4767721 (1988-08-01), Liao et al.
patent: 4770739 (1988-09-01), Orvek et al.
patent: 4784936 (1988-11-01), White et al.
patent: 4806453 (1989-02-01), Vidusek et al.
patent: 4863827 (1989-09-01), Jain et al.
patent: 5091342 (1992-02-01), Studebaker et al.
patent: 5140469 (1992-08-01), Lamarre et al.
patent: 5221596 (1993-06-01), Keller
patent: 5260172 (1993-11-01), Ito
patent: 5296333 (1994-03-01), Lamarre
patent: 5679608 (1997-10-01), Cheung et al.
patent: 5728504 (1998-03-01), Hosoda et al.
patent: 5817444 (1998-10-01), Sato et al.
patent: 5830624 (1998-11-01), Bae et al.
patent: 5889788 (1999-03-01), Pressly et al.
patent: 6156487 (2000-12-01), Jennison et al.
patent: 6156665 (2000-12-01), Hamm et al.
patent: 6653244 (2003-11-01), Behfar et al.
patent: 6811853 (2004-11-01), Sherrer et al.
patent: 2005/0074698 (2005-04-01), Borodovsky
patent: 2006/0141385 (2006-06-01), Kaule

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