Lithographic projection apparatus and device manufacturing...

Photocopying – Projection printing and copying cameras – Distortion introducing or rectifying

Reexamination Certificate

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Details

C355S053000, C355S067000, C355S071000, C250S492200, C250S548000, C430S311000, C359S204200, C359S291000, C359S572000

Reexamination Certificate

active

07081944

ABSTRACT:
A system and method is used to pattern a substrate. A projection beam received from a radiation system is patterned using an array of individually controllable elements. A portion of the projection beam is directed directly onto one of the individually controllable elements and collecting radiation reflected therefrom using each one of a first array of focusing elements. An image of the first array of focusing elements is projected onto a second array of focusing elements using a projection system, such that radiation reflected from one of the individually controllable elements is projected via one of the focusing elements in the first array of focusing elements and the projection system to one of the focusing elements in the second array which focuses the radiation onto a spot on the substrate.

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European Search Report from European Patent Application No. 04257818.7, 6 pages, dated May 18, 2005.

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