Lithographic processes employing radiation sensitive polymers an

Details Lithographic processes employing radiation sensitive polymers an Lithographic processes employing radiation sensitive polymers an

1996-03-11

1998-03-17

Lesmes, George F.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430325, 430326, 430919, 430921, 4302701, G03C 516, G03C 1492

Patent

active

057285063

ABSTRACT:
The use of a terpolymer significantly enhances the properties of resists suitable for deep UV lithography in the manufacture of semiconductor devices. This terpolymer is one represented by the polymer formed from sulfur dioxide, an acid-sensitive monomer moiety and a monomer that imparts polarity to the final terpolymer.

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Journal of Vacuum Science and Technology, 12, No. 6, 1317, 1975, B.J. Lin.
Advances in Macromolecular Chemistry, 7, 335, 1968, K.J. Ivin and J.B. Rose .

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