Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2006-10-31
2006-10-31
McPherson, John A. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S317000, C430S318000, C430S311000
Reexamination Certificate
active
07129026
ABSTRACT:
This invention provides a lithographic process for multi-etching steps by using single reticle, wherein the develop step is performed next to a bake step after the photoresist layer has been exposed, such that a photoresist residue is formed on the peripheral region around a transformed pattern of the photoresist. Because the photoresist residue has thinner thickness compared to the photoresist layer, this kind of developed photoresist layer can be used as the very mask for multi-etching steps.
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patent: 6352818 (2002-03-01), Hsieh
patent: 6608658 (2003-08-01), Tsujimura et al.
patent: 6643008 (2003-11-01), Stirton et al.
Chang Jui-chung
Hsu Yi-Tsai
Kao Chin-Tzu
Liu Da-Yo
Chacko-Davis Daborah
Chungwha Picture Tubes, Ltd.
McPherson John A.
Perkins Coie LLP
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