Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1997-08-25
1999-09-28
Duda, Kathleen
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
4302701, 430330, G03F 700
Patent
active
059586540
ABSTRACT:
A process for device fabrication is disclosed. In the process, an energy sensitive material is formed on a substrate. The energy sensitive resist material contains a polymer or a polymer blend in combination with an energy-sensitive material such as a photoacid generator. At least three substituents are distributed on the polymer blend. The first of these substituents is a hydroxyl (OH) group. The second of these substituents is an acid-sensitive or acid labile group which is cleaved in the presence of acid and replaced by an OH group. The third of these substituents forms hydrogen bonds with the first group. The ratio of the number of OH substituents relative to the number of substituents that hydrogen bond to the OH substituents (mole percent) is about 40:1 to at least about 1:1. The relative amounts of the first and third substituents is selected to provide a resist material with a glass transition temperature of at least about 60.degree.. After a layer of the energy sensitive resist material is formed on the substrate, an image of a pattern is introduced into the energy-sensitive material via a patternwise exposure to radiation. The image is thereafter developed into a pattern, and transferred into the underlying substrate.
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Galvin-Donoghue Mary Ellen
Houlihan Francis Michael
Kometani Janet Mihoko
Nalamasu Omkaram
Neenan Thomas Xavier
Botos Richard J.
Duda Kathleen
Lucent Technologies - Inc.
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