Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2006-08-14
2008-11-04
McPherson, John A. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C359S490020, C359S483010, C355S077000, C355S067000
Reexamination Certificate
active
07445883
ABSTRACT:
The present invention provides systems and methods for improved lithographic printing with polarized light. In embodiments of the present invention, polarized light (radially or tangentially polarized) is used to illuminate a phase-shift mask (PSM) and produce an exposure beam. A negative photoresist layer is then exposed by light in the exposure beam. A chromeless PSM can be used. In further embodiments of the present invention, radially polarized light is used to illuminate a mask and produce an exposure beam. A positive photoresist layer is then exposed by light in the exposure beam. The mask can be an attenuating PSM or binary mask. A very high image quality is obtained even when printing contact holes at various pitches in low k applications.
REFERENCES:
patent: 3917399 (1975-11-01), Buzawa et al.
patent: 5144362 (1992-09-01), Kamon et al.
patent: 5436761 (1995-07-01), Kamon
patent: 5442184 (1995-08-01), Palmer et al.
patent: 5467166 (1995-11-01), Shiraishi
patent: 5537260 (1996-07-01), Williamson
patent: 5539514 (1996-07-01), Shishido et al.
patent: 5541026 (1996-07-01), Matsumoto
patent: 6108140 (2000-08-01), Hashimoto et al.
patent: 6163367 (2000-12-01), Obszarny
patent: 6229647 (2001-05-01), Takahashi et al.
patent: 6404482 (2002-06-01), Shiraishi
patent: 6819405 (2004-11-01), Mulkens et al.
patent: 7090964 (2006-08-01), Baba-Ali et al.
patent: 2002/0176166 (2002-11-01), Schuster
patent: 2004/0075895 (2004-04-01), Lin
patent: 2004/0245439 (2004-12-01), Shaver
patent: 1 091 252 (2001-04-01), None
patent: 05-090128 (1993-04-01), None
patent: 07-094399 (1995-04-01), None
patent: 07-122469 (1995-05-01), None
patent: 09-160219 (1997-06-01), None
patent: 11-191532 (1999-07-01), None
patent: 2006-135346 (2006-05-01), None
patent: 137348 (1998-02-01), None
patent: 2003-6953 (2003-01-01), None
patent: WO 01/22164 (2001-03-01), None
European Search Report for European Application No. 04713708.8—1226 dated Jul. 24, 2007, three (3) pages.
Translation of Office Action and Office Action for Japanese Patent Application No. 2005-501718 mailed Dec. 26, 2007, 8 pgs.
“Understanding the Forbidden Pitch Phenomenon and Assist Feature Placement,” Shi et al., SPIE vol. 4689: 985-996 (2002). cited by other.
“Forbidden Pitches for 130nm Lithography and Below,” Socha et al., SPIE vol. 4000: 1140-1155 (2000). cited by other.
A. K. Wong, Resolution Enhancement Techniques in Optical Lithography, SPIE Press, pp. 28-29. cited by other, no date.
“Impact of Illumination Coherence and Polarization on the Imaging of Attenuated Phase Shift Masks,” Ma et al., SPIE vol. 4346: 1522-1532 (2001). cited by other.
“Solutions for Printing Sub 100nm contacts with ArF,” Graupner et al., SPIE vol. 4691: 503-514 (2002). cited by other.
“The Vortex Via Mask: Making 80nm Contacts With a Twist!,” Levenson et al., SPIE vol. 4889 (2002). cited by other.
“Overcoming the Resolution Challenge Using Special Illumination Techniques to Print 50/50 nm Nested Contact Holes at 157 nm Wavelength,” Baba-Ali et al., SPIE vol. 5040: 1352-1363 (2003). cited by other.
Office Action for Korean Patent Application No. 10-2004-7016864, mailed Mar. 22, 2006, 2 pages. cited by other.
English translation of the Examiner's Ground for Rejection for Korean Patent Application No. 10-2004-7016864, 1 page. cited by other.
Baba-Ali Nabila
Kreuzer Justin
Sewell Harry
ASML Holding N.V.
Chacko Davis Daborah
McPherson John A.
Sterne Kessler Goldstein & Fox P.L.L.C.
LandOfFree
Lithographic printing with polarized light does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Lithographic printing with polarized light, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithographic printing with polarized light will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4020459