Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2006-08-15
2006-08-15
McPherson, John A. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S005000, C430S322000, C359S490020, C359S483010, C359S494010, C359S558000, C355S067000, C355S071000
Reexamination Certificate
active
07090964
ABSTRACT:
The present invention provides systems and methods for improved lithographic printing with polarized light. In embodiments of the present invention, polarized light (radially or tangentially polarized) is used to illuminate a phase-shift mask (PSM) and produce an exposure beam. A negative photoresist layer is then exposed by light in the exposure beam. A chromeless PSM can be used. In further embodiments of the present invention, radially polarized light is used to illuminate a mask and produce an exposure beam. A positive photoresist layer is then exposed by light in the exposure beam. The mask can be an attenuating PSM or binary mask. A very high image quality is obtained even when printing contact holes at various pitches in low k applications.
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Office Action for Korean Patent Application No. 10-2004-7016864, mailed Mar. 22, 2006, 2 pages.
English translation of the Examiner's Ground for Rejection for Korean Patent Application No. 10-2004-7016864, 1 page.
Baba-Ali Nabila
Kreuzer Justin
Sewell Harry
ASML Holding N.V.
Chacko-Davis Daborah
McPherson John A.
Sterne, Kressler, Goldstein & Fox, P.L.L.C.
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