Lithographic photomask and method of manufacture to improve...

Details Lithographic photomask and method of manufacture to improve... Lithographic photomask and method of manufacture to improve...

2005-12-13

2005-12-13

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

06974652

ABSTRACT:
A photomask for use in a lithographic process and a method of making a photomask are disclosed. A mask blank including a substrate, a sacrificial conductive layer disposed over the substrate and a radiation shielding layer disposed over the sacrificial conductive layer can be provided. Structures are then formed from the radiation shielding layer to define a pattern. Measurement of parameters associated with the structures are made with a measurement tool and, during the measuring, the sacrificial conductive layer provides a conductive plane to dissipate charge transferred to the mask by the measurement tool.

REFERENCES:
patent: 5436097 (1995-07-01), Norishima et al.
patent: 5750290 (1998-05-01), Yasuzato et al.
patent: 6589699 (2003-07-01), Kaneko et al.

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