Lithographic patterning method and mask set therefor with light

Details Lithographic patterning method and mask set therefor with light Lithographic patterning method and mask set therefor with light

1996-10-31

1998-09-15

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 22, 430322, G03F 900

Patent

active

058076492

ABSTRACT:
A lithographic patterning method and mask set using a phase shift trim mask having mask dimensions increased in block size so as to remove previous exposure defects.

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Waas, et al., Microelectronic Engineering, 23 (Nov. 1994), pp. 139-142.
Levenson, Marc, Jpn. J. Appl. Phys., vol. 33 (Dec. 1994), Part 1, No. 12B, Dec. 1994, pp. 6765-6773.
Galan, G., et al., Jpn. J. Appl. Phys., vol. 33 (Dec., 1994), Part 1, No. 12B, Dec. 1994, pp.

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