Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-07-05
2010-06-29
Walke, Amanda C. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S273100, C430S331000, C430S396000
Reexamination Certificate
active
07745095
ABSTRACT:
A substrate processing method of a substrate provided with an anti-reflective coating which extends to or beyond a peripheral edge of the substrate is disclosed. The method includes removing a portion of the anti-reflective coating adjacent to and around a periphery of the substrate using a back-side removal process, depositing a layer of radiation sensitive material onto the anti-reflective coating, depositing a top-coat layer onto the layer of radiation sensitive material, and simultaneously removing a portion of the layer of radiation sensitive material and a portion of the top-coat layer from around an area adjacent to the periphery of the substrate using a top-side removal process.
REFERENCES:
patent: 7354693 (2008-04-01), Hatakeyama et al.
patent: 2004/0224516 (2004-11-01), Peterson et al.
Gehoel Van Ansem Wendy Fransisca Johanna
Maas Rudolf Adrianus Joannes
Wang Suping
Wong Patrick
ASML Netherlands B.V.
Pillsbury Winthrop Shaw & Pittman LLP
Walke Amanda C.
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