Lithographic fabrication with treatment of "living polymer"

Details Lithographic fabrication with treatment of "living polymer" Lithographic fabrication with treatment of "living polymer"

1978-07-24

1980-05-06

Kimlin, Edward C.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

96 351, 96115R, 96 362, 204158HA, 20415417, 2041592, 427 44, 427 431, 526293, 430942, 430966, 430322, 430329, 430285, G03C 500, G03C 168

Patent

active

042015804

ABSTRACT:
Fabrication of fine dimensioned circuits, e.g., VLSI includes at least one lithographic step dependent upon members of a particular category of polymer resists. Such resists, generally negative acting, are characterized by high contrast due to unusually narrow molecular weight distribution of the polymer molecules. This distribution is in turn dependent upon choice of a base polymer which is itself characterized by narrow molecular weight distribution due to "living polymerization" (solution anionic, polymerization). Functionalization of such base polymer is designedly such as to retain narrow distribution. Chlorinated polystyrene is exemplary of the resist category.

REFERENCES:
patent: 3370981 (1968-02-01), Ney et al.
patent: 3425867 (1969-02-01), Stillo et al.
patent: 3679497 (1972-07-01), Handy et al.
patent: 3798187 (1974-03-01), Miyoshi et al.
patent: 3984583 (1976-10-01), Hermans et al.
patent: 4061799 (1977-12-01), Brewer
patent: 4143221 (1979-03-01), Naarmann et al.
Jenkins et al., Journal of Applied Polymer Science, vol. 12, 1968, pp. 2059-2066. _

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