Lithographic double-coated patterning plate with undercoat level

Details Lithographic double-coated patterning plate with undercoat level Lithographic double-coated patterning plate with undercoat level

1994-08-09

1996-03-12

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Radiation sensitive product

Antihalation or filter layer containing

430166, 4302711, 430510, G03C 1815

Patent

active

054985145

ABSTRACT:
An improvement is proposed in a double-coated patterning plate, which consists of a substrate, an undercoat levelling layer and a photoresist layer thereon, as well as in the patterning method therewith. Different from conventional double-coated patterning plate in which the undercoat levelling layer is formed from poly(methyl methacrylate) resin, the layer in the invention is formed from a copolymeric resin of methyl methacrylate and glycidyl methacrylate in a specified copolymerization ratio and the resin is admixed with 2,2',4,4'-tetrahydroxybenzophenone. By virtue of the use of this unique resin composition for the undercoat levelling layer, the troubles due to intermixing between the undercoat levelling layer and the photoresist layer thereon can be avoided to impart the patterned resist layer with excellent properties.

REFERENCES:
patent: 5130223 (1992-07-01), Nishimura et al.
patent: 5158857 (1992-10-01), Shinozaki et al.

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