Lithographic device with a three-dimensionally positionable mask

Details Lithographic device with a three-dimensionally positionable mask Lithographic device with a three-dimensionally positionable mask

1996-05-02

1998-06-16

Moses, R. L.

Photocopying

Projection printing and copying cameras

Step and repeat

355 72, 355 75, G03B 2742, G03B 2758, G03B 2762

Patent

active

057679487

ABSTRACT:
A lithographic device includes a machine frame which supports a substrate holder, a focusing system and a mask holder in a vertical direction. The substrate holder is displaceable parallel to a horizontal X-direction and a horizontal Y-direction perpendicular to the X-direction by a first positioning device, and the mask holder is displaceable parallel to the X-direction by a second positioning device. The substrate holder and the mask holder are displaced synchronously parallel to the X-direction during exposure of a semiconductor substrate. The second positioning device is capable of positioning the mask holder also parallel to the Y-direction and of rotating it about a vertical axis of rotation. Therefore, a displacement of the mask holder has a parallelism to the X-direction which is determined by a positioning accuracy of the second positioning device and which is not adversely affected by a deviation from parallelism and straightness of a guide of the second positioning device. An accuracy with which the semiconductor substrate is exposed is improved by a factor corresponding to an optical reduction factor of the focusing system.

REFERENCES:
patent: 4803712 (1989-02-01), Kembo et al.
patent: 4952060 (1990-08-01), Ina et al.
patent: 5194893 (1993-03-01), Nishi
patent: 5359389 (1994-10-01), Ishota

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