Gas separation: apparatus – Electric field separation apparatus – Including gas flow distribution means
Patent
1975-03-03
1977-01-04
Louie, Jr., Won H.
Gas separation: apparatus
Electric field separation apparatus
Including gas flow distribution means
96 95, 96109, 96107, G03C 106, G03C 520
Patent
active
040010210
ABSTRACT:
An improved lith-type silver halide photosensitive material of a wide latitude for infectious developing is disclosed which comprises, in an amount of 5 mg to 5 g per mole of silver halide, a compound represented by the following general formula: ##STR1## wherein R.sub.1 is a substituted or unsubstituted alkyl, aryl, aralkyl, arythio or aryloxy group, and R.sub.2 is hydrogen, halogen, alkyl, alkoxy or nitro.
REFERENCES:
patent: 3271154 (1966-09-01), Dersch et al.
patent: 3615501 (1971-10-01), Shimamura et al.
patent: 3615517 (1971-10-01), Milton et al.
patent: 3708303 (1973-01-01), Salesin
patent: 3756821 (1973-09-01), Hayashi et al.
patent: 3785822 (1974-01-01), Overman
patent: 3895948 (1975-07-01), Shiba et al.
Habu Teiji
Hayashi Eisaku
Mitsui Katsuhide
Nakajima Tomio
Sakamoto Elichi
Konishiroku Photo Industry Co,., Ltd.
Louie, Jr. Won H.
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