Lithographic developer containing surfactant

Details Lithographic developer containing surfactant Lithographic developer containing surfactant

1995-02-27

1999-12-28

Nuzzolillo, Maria

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Finishing or perfecting composition or product

430326, 430325, G03C 500

Patent

active

060079703

ABSTRACT:
Provided is a lithographic developer used to develop a resist pattern having regions with different sizes and shapes, by dissolving and removing a resist region of a resist layer formed in the resist pattern, wherein the developer comprises a surfactant capable of increasing the dissolution of a resist in the resist region to be dissolved and removed, having a smaller dissolving-and-removing area on the surface of the resist layer.

REFERENCES:
patent: 4395480 (1983-07-01), Sprintschnik
patent: 4670372 (1987-06-01), Lewis et al.
patent: 4749640 (1988-06-01), Tremont et al.
patent: 4945030 (1990-07-01), Turner et al.
patent: 5030550 (1991-07-01), Kawabe et al.
patent: 5106724 (1992-04-01), Nogami et al.
Patent Abstracts of Japan, vol. 13, No. 375, (P-921) Aug. 1989, for JP-A-1-129250.

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