Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Reexamination Certificate
2007-09-18
2007-09-18
Chowdhury, Tarifur (Department: 2886)
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
C430S022000, C430S030000, C355S077000
Reexamination Certificate
active
11019529
ABSTRACT:
A lithographic apparatus having an actuator to move an object with a mark that includes a plurality of structures arranged in rows and columns. An alignment arrangement has a light source, optics and a detector. The light source and the optics produce an alignment beam with a first spot portion extending in a first direction that is parallel to the columns and a second spot portion extending in a second direction that is parallel to the rows. The optics direct the alignment beam to the mark, receive alignment radiation back from the mark and transmit the alignment radiation to the detector. The detector transmits an alignment signal to a processor that calculates a two-dimensional position of the mark based on the alignment signal.
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Kazuya Ota, et al., “New Alignment Sensors for Wafer Stepper”, SPIE, vol. 1463, Optical/Laser Microlithography IV (1991), pp. 304-314.
Nigel R. Farrar, et al., “Performance of through-the-lens/off-axis laser alignment systems and alignment algorithms on Nikon wafer steppers”, SPIE vol. 1673, Integrated Circuit Metrology, Inspection and Process Control VI (1992), pp. 369-380.
Translation of Taiwanese Office Action issued in Taiwan Patent Application No. 094143896 dated Mar. 19, 2007.
ASML Netherlands B.V.
Chowdhury Tarifur
Pajoohi Tara S
Pillsbury Winthrop Shaw & Pittman LLP
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