Lithographic apparatus with multiple alignment arrangements...

Optics: measuring and testing – By alignment in lateral direction – With registration indicia

Reexamination Certificate

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Reexamination Certificate

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07626701

ABSTRACT:
A lithographic apparatus has a plurality of different alignment arrangements that are used to perform an alignment measurement on the same mark(s) by: detecting a first alignment mark located on an object and producing a first alignment signal by a first detector; detecting the first mark and producing a second alignment signal by a second detector using a different alignment measurement than the first detector; receiving the first alignment signal from the first detector; calculating a first position of the at least first mark based on the first alignment signal; receiving the second alignment signal from the second detector; calculating a further first position of the at least first mark based on the second alignment signal.

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Nigel R. Farrar et al., “Performance of through-the-lens/off-axis laser alignment systems and alignment algorithms on Nikon wafer steppers”, SPIE Integrated Circuit Metrology, vol. 1673, pp. 369-380 (1992) XP002368704.
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European Search Report issued in EP 05 11 2067 dated Mar. 9, 2006.
English Translation of Japanese Official Action issued on Dec. 19, 2008 in Japanese Application No. 2005-373178.

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