Lithographic apparatus with contamination suppression,...

Details Lithographic apparatus with contamination suppression,... Lithographic apparatus with contamination suppression,...

2006-06-13

2006-06-13

Perkey, W. B. (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000

Reexamination Certificate

active

07061574

ABSTRACT:
A lithographic projection apparatus is provided. The apparatus includes a radiation system for providing a beam of radiation, and a support for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam of radiation onto a target portion of the substrate, and a particle supply unit for supplying getter particles into the beam of radiation in order to act as a getter for contamination particles in the beam of radiation. The getter particles have a diameter of at least about 1 nm.

REFERENCES:
patent: 6614505 (2003-09-01), Koster et al.
patent: 2003/0053594 (2003-03-01), Fornaciari et al.
patent: 2004/0099820 (2004-05-01), Bristol
patent: 2004/0119394 (2004-06-01), Klebanoff et al.
patent: 2005/0016679 (2005-01-01), Ruzic et al.
patent: 2005/0139785 (2005-06-01), Banine et al.
patent: 2005/0140945 (2005-06-01), Banine et al.
patent: WO/99/42904 (1999-08-01), None

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