Lithographic apparatus substrate alignment

Details Lithographic apparatus substrate alignment Lithographic apparatus substrate alignment

2005-06-30

2008-08-05

Mathews, Alan A (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S077000, C356S401000

Reexamination Certificate

active

07408618

ABSTRACT:
A method for aligning a substrate in a lithographic apparatus includes determining from a geometric reference of the substrate a position of a window on the substrate. The window indicates an area in which an alignment mark of the substrate may be expected. Then, a position of the alignment mark is measured in the window. A relationship between the measured position of the alignment mark and the position of the window is determined. The relationship is stored in a database and the substrate is aligned making use of the measured position of the alignment mark.The above may be repeated for a following aligning of the substrate, prior however to the measuring of the position of the alignment mark in the window, the position of the window is amended making use of the relationship between the measured position of the alignment mark and the position of the window as stored in the database for one or more preceding alignings.

REFERENCES:
patent: 5627624 (1997-05-01), Yim et al.
patent: 5795687 (1998-08-01), Yasuda
patent: 5798195 (1998-08-01), Nishi
patent: 6635395 (2003-10-01), Hahmann et al.
patent: 2005/0089762 (2005-04-01), Consolini et al.

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