Lithographic apparatus, radiation system, contaminant trap,...

Details Lithographic apparatus, radiation system, contaminant trap,... Lithographic apparatus, radiation system, contaminant trap,...

Filed on

2007-12-11

Date issued

2007-12-11

Examiner

Berman, Jack I. (Department: 2881)

Patent Class

Radiant energy

SubClass

Irradiation of objects or material

SubSubClass

Irradiation of semiconductor devices

Other Related Categories

C250S50400H

Type

Reexamination Certificate

Status

active

Patent number

10890404

Description

ABSTRACT:
A lithographic apparatus includes a radiation system that includes a source for producing a radiation beam, a contaminant trap arranged in a path of the radiation beam, and an illumination system configured to condition the radiation beam produced by the source, and a support for supporting a patterning device. The patterning device serves to impart the conditioned radiation beam with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, and a projection system for projecting the patterned radiation beam onto a target portion of the substrate. The contaminant trap includes a plurality of foils that define channels that are arranged substantially parallel to the direction of propagation of the radiation beam. The trap is provided with a gas supply system that is arranged to inject gas into at least one of the channels of the trap.

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patent: WO99/42904 (1999-08-01), None
patent: WO02/054153 (2002-07-01), None

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