Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Reexamination Certificate
2006-11-14
2006-11-14
Wells, Nikita (Department: 2881)
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
C250S442110, C250S50400H, C250S492100, C355S076000
Reexamination Certificate
active
07135692
ABSTRACT:
A lithographic apparatus is disclosed. The lithographic apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The illumination system includes a radiation-production system that produces extreme ultra-violet radiation, and a radiation-collection system that collects extreme ultra-violet radiation. Particles that are produced as a by-product of extreme ultra-violet radiation production move substantially in a particle-movement direction. The radiation-collection system is arranged to collect extreme ultra-violet radiation which radiates in a collection-direction, which is substantially different from the particle-movement direction.
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European Search Report for Application No. 04078219.5, dated Apr. 8, 2005.
Banine Vadim Yevgenyevich
Ivanov Vladimir Vital'evitch
Koshelev Konstantin Nikolaevitch
ASML Netherlands B.V.
Pillsbury Winthrop Shaw & Pittman LLP
Quash Anthony
Wells Nikita
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