Lithographic apparatus having a monitoring device for...

Radiant energy – Radiant energy generation and sources – With radiation modifying member

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C250S365000, C250S370080, C250S370090, C250S372000, C250S461100, C359S350000

Reexamination Certificate

active

07405417

ABSTRACT:
A lithographic apparatus is disclosed. The apparatus includes a projection system configured to project a first radiation beam onto a target portion of a substrate, and at least one monitoring device for detecting contamination in a interior space. The monitoring device includes at least one dummy element having at least one contamination receiving surface. In an aspect of the invention, there is provided at least one dummy element which does not take part in transferring a radiation beam onto a target portion of a substrate, wherein it is monitored whether a contamination receiving surface of the dummy element has been contaminated.

REFERENCES:
patent: 4574194 (1986-03-01), Coats et al.
patent: 5487981 (1996-01-01), Nivens et al.
patent: 6545272 (2003-04-01), Kondo
patent: 6649403 (2003-11-01), McDevitt et al.
patent: 6724460 (2004-04-01), Van Schaik et al.
patent: 6828569 (2004-12-01), Van Schaik et al.
patent: 6906777 (2005-06-01), Kye et al.
patent: 6924492 (2005-08-01), Van Schaik
patent: 6980281 (2005-12-01), Moors et al.
patent: 7012265 (2006-03-01), Van Der Veen
patent: 7064324 (2006-06-01), Onishi
patent: 7115886 (2006-10-01), Van Schaik et al.
patent: 7116394 (2006-10-01), Bakker et al.
patent: 7142287 (2006-11-01), Kroon et al.
patent: 7145641 (2006-12-01), Kroon et al.
patent: 7156925 (2007-01-01), Subramanian et al.
patent: 7230674 (2007-06-01), Kroon et al.
patent: 2002/0037461 (2002-03-01), Van Der Werf et al.
patent: 2002/0083409 (2002-06-01), Hamm
patent: 2004/0130694 (2004-07-01), Kurt et al.
patent: 2004/0227102 (2004-11-01), Kurt et al.
patent: 2005/0133727 (2005-06-01), Banine et al.
patent: 2005/0140956 (2005-06-01), Kroon et al.
patent: 2006/0066824 (2006-03-01), Knappe et al.
patent: 2007/0115443 (2007-05-01), Box et al.
patent: 2007/0115445 (2007-05-01), Box et al.
patent: 2007/0132989 (2007-06-01), Kaller et al.
patent: 2007/0138414 (2007-06-01), Stevens et al.
patent: 2007/0242247 (2007-10-01), Shiraishi
patent: 2007/0291239 (2007-12-01), Shiraishi
patent: 1 452 851 (2004-09-01), None
patent: 407153634 (1995-06-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Lithographic apparatus having a monitoring device for... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Lithographic apparatus having a monitoring device for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithographic apparatus having a monitoring device for... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2795246

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.