Photocopying – Projection printing and copying cameras – With temperature or foreign particle control
Reexamination Certificate
2007-07-31
2007-07-31
Rutledge, D. (Department: 2851)
Photocopying
Projection printing and copying cameras
With temperature or foreign particle control
C355S053000, C355S067000, C355S069000, C355S077000, C250S492200, C250S50400H, C378S034000, C378S119000
Reexamination Certificate
active
10748851
ABSTRACT:
A lithographic apparatus is disclosed. The apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a debris-mitigation system that mitigates debris particles which are formed during use of at least a part of the lithographic apparatus. The debris-mitigation system is arranged to apply a magnetic field so that at least charged debris particles are mitigated.
REFERENCES:
patent: 4743364 (1988-05-01), Kyrazis
patent: 4837794 (1989-06-01), Riordan et al.
patent: 5453125 (1995-09-01), Krogh
patent: 6377651 (2002-04-01), Richardson et al.
patent: 6657188 (2003-12-01), Hulet et al.
patent: 2003/0190012 (2003-10-01), Ahmad
patent: 2005/0016679 (2005-01-01), Ruzic et al.
patent: 2005/0230645 (2005-10-01), Melnychuk et al.
patent: 2006/0037940 (2006-02-01), Yan et al.
patent: 1 223 468 (2002-07-01), None
patent: WO9919527 (1999-04-01), None
patent: WO 03/087867 (2003-10-01), None
Bakker Levinus Pieter
Banine Vadim Yevgenyevich
Ivanov Vladimir Vital'evitch
Moors Johannes Hubertus Josephina
Veefkind Abraham
ASML Netherlands B.V.
Pillsbury Winthrop Shaw & Pittman LLP
Rutledge D.
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