Lithographic apparatus having a contaminant trapping system,...

Details Lithographic apparatus having a contaminant trapping system,... Lithographic apparatus having a contaminant trapping system,...

2007-01-09

2007-01-09

Fuller, Rodney (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S071000

Reexamination Certificate

active

10944422

ABSTRACT:
A lithographic apparatus includes an illumination system configured to condition a radiation beam substantially from a light emitting point. The illumination system includes a contaminant trapping system. The trapping system includes a contaminant trap having a central zone and a peripheral zone. The trap includes a plurality of platelets that extend substantially outwards through the peripheral zone. The light emitting point is in a plane with which the platelets coincide. Each of the platelets has a normal with a component directed towards the central zone.

REFERENCES:
patent: 6753941 (2004-06-01), Visser
patent: 6927403 (2005-08-01), Singer et al.
patent: 2004/0108465 (2004-06-01), Bakker et al.
patent: 2004/0184014 (2004-09-01), Bakker et al.
patent: 1 223 468 (2002-07-01), None
patent: 1 274 287 (2003-01-01), None
patent: 1 391 785 (2004-02-01), None
patent: WO 99/42904 (1999-08-01), None

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