Optics: measuring and testing – By dispersed light spectroscopy – Utilizing a spectrometer
Patent
1997-03-04
2000-07-04
Turner, Samuel A.
Optics: measuring and testing
By dispersed light spectroscopy
Utilizing a spectrometer
356363, 356351, G01B 902
Patent
active
060846739
ABSTRACT:
A lithographic projection apparatus for step-and-scan imaging of a mask pattern (c) on a substrate (W) is described. The synchronous movement of the mast (MA) and the substrate (W) during scanning is controlled by means of contactless measuring systems, inter alia, interferometer systems (ISR, ISW), while the measuring faces (R.sub.1,r, R.sub.1,w) associated with these systems are formed by faces of the holders (WH, MH) for the substrate (W) and the mask (MA), so that very accurate measurements are possible.
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SPIE, vol. 1088: Optical/Laser Microlithography, pp. 268-272.
Straaijer Alexander
van den Brink Marinus A.
ASM Lithography B.V.
Turner Samuel A.
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