Lithographic apparatus, device manufacturing method and a...

Details Lithographic apparatus, device manufacturing method and a... Lithographic apparatus, device manufacturing method and a...

2007-02-13

2007-02-13

Schilling, Richard L. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S327000, C430S396000, C430S494000, C355S055000, C355S063000, C355S077000

Reexamination Certificate

active

10898674

ABSTRACT:
A substrate is provided with a coating of material which is substantially transparent to the wavelength of the projection beam. The coating may be thicker than the wavelength of the projection beam and have a refractive index of the coating such that the wavelength of the projection beam is shortened as it passes through it. This allows the imaging of smaller features on the substrate. Alternatively, the coating may be used with a liquid supply system and act to keep bubbles away from a radiation sensitive layer of the substrate.

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