Lithographic apparatus, device manufacturing method, and...

Photocopying – Projection printing and copying cameras – Detailed holder for original

Reexamination Certificate

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C355S076000, C430S005000

Reexamination Certificate

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07423733

ABSTRACT:
The invention pertains to a lithographic apparatus that includes a docking system for positioning a patterning device, such as a reticle, relative to the reticle stage. The lithographic projection apparatus has an operational cycle that includes a projection phase, in which the reticle stage carries the patterning device and an exchange phase, in which the patterning device is exchanged and the docking system positions the patterning device relative to the reticle stage. The docking system is configured to be spaced from the patterning device during the projection phase in order to ensure that a higher accuracy of the projected image is obtained.

REFERENCES:
patent: 4598242 (1986-07-01), Hayashi et al.
patent: 4760429 (1988-07-01), O'Connor
patent: 5229872 (1993-07-01), Mumola
patent: 5296891 (1994-03-01), Vogt et al.
patent: 5523193 (1996-06-01), Nelson
patent: 5544213 (1996-08-01), Chiba et al.
patent: 5969441 (1999-10-01), Loopstra et al.
patent: 6046792 (2000-04-01), Van Der Werf et al.
patent: 6260282 (2001-07-01), Yuan et al.
patent: 2002/0043163 (2002-04-01), Novak
patent: 1 237 045 (2002-09-01), None
patent: 1237045 (2002-09-01), None
patent: 6-53116 (1994-02-01), None
patent: 7-153663 (1995-06-01), None
patent: 11-184095 (1999-07-01), None
patent: 2000-36531 (2000-02-01), None
patent: WO 98/33096 (1998-07-01), None
patent: WO 98/38597 (1998-09-01), None
patent: WO 98/40791 (1998-09-01), None

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