Lithographic apparatus, device manufacturing method, and...

Optics: measuring and testing – Range or remote distance finding – Triangulation ranging to a point with two or more projected...

Reexamination Certificate

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C356S004050, C356S614000, C356S623000, C355S067000

Reexamination Certificate

active

07119886

ABSTRACT:
In a lithographic projection apparatus, a measuring system configured to measure the position of the projection system relative to a reference frame includes sensors rigidly mounted in relation to counterpart sensors of a measuring system measuring the substrate table position. An angular encoder which sends light from a target down two optical paths having opposite sensitivities to tilt is used to measure rotation of the projection system about its optical axis.

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patent: 5151749 (1992-09-01), Tanimoto et al.
patent: 5801832 (1998-09-01), Van Den Brink
patent: 6160628 (2000-12-01), Inoue
patent: 6271923 (2001-08-01), Hill
patent: 2002/0001082 (2002-01-01), Akimoto et al.
patent: 2002/0017890 (2002-02-01), Ebihara et al.
patent: 2003/0053074 (2003-03-01), Hill
patent: 1 052 683 (2000-11-01), None

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