Lithographic apparatus, device manufacturing method, and...

Optics: measuring and testing – By light interference – For dimensional measurement

Reexamination Certificate

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Reexamination Certificate

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07352473

ABSTRACT:
In an interferometric displacement measuring system, a correction for beamshear is made. The correction may be a polynomial of a variable proportional to the length of the optical path traversed by the measurement beam and the angle of the measurement mirror. The correction compensates for errors caused by non-planarity of the wavefront of the measurement beam.

REFERENCES:
patent: 5363196 (1994-11-01), Cameron
patent: 5764361 (1998-06-01), Kato et al.
patent: 6906784 (2005-06-01), Hill
patent: 2002/0033951 (2002-03-01), Hill
patent: 2002/0167675 (2002-11-01), Inoue et al.
patent: 2002-365016 (2002-12-01), None

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