Photocopying – Projection printing and copying cameras – Illumination systems or details
Reexamination Certificate
2011-03-08
2011-03-08
Nguyen, Hung Henry (Department: 2882)
Photocopying
Projection printing and copying cameras
Illumination systems or details
C355S030000
Reexamination Certificate
active
07903234
ABSTRACT:
In a lithographic apparatus, a corrective irradiation procedure is performed using an illumination mode arranged so as to heat a selected part of an element of the projection system near a pupil plane thereof that is relatively unheated during production exposure. The corrective irradiation procedure aims to improve uniformity of optical element heating of the projective system and/or to reduce a phase gradient.
REFERENCES:
patent: 6031946 (2000-02-01), Bergmann et al.
patent: 6504597 (2003-01-01), Schuster et al.
patent: 6538722 (2003-03-01), Matsumoto et al.
patent: 6603530 (2003-08-01), Kohno
patent: 6642994 (2003-11-01), Mori et al.
patent: 6930754 (2005-08-01), Sugita et al.
patent: 6980278 (2005-12-01), Aoyama et al.
patent: 7319507 (2008-01-01), Yonekawa et al.
patent: 2004/0021845 (2004-02-01), Kawahara
patent: 2004/0108467 (2004-06-01), Eurlings et al.
patent: 2007/0013888 (2007-01-01), Flagello et al.
patent: 0 949 541 (1999-10-01), None
patent: 1 109 067 (2001-06-01), None
patent: 0 949 541 (2001-09-01), None
patent: 1 109 067 (2003-06-01), None
patent: 1 367 446 (2003-12-01), None
patent: 08-221261 (1996-08-01), None
patent: 10-064790 (1998-03-01), None
patent: 10-079337 (1998-03-01), None
patent: 2000-021722 (2000-01-01), None
patent: 2001-250761 (2001-09-01), None
patent: 2002-057081 (2002-02-01), None
patent: 2004-063988 (2004-02-01), None
patent: 2005-311020 (2005-11-01), None
patent: WO 2004/051716 (2004-06-01), None
patent: WO 2006/025408 (2006-03-01), None
English Language Abstract for Japanese Patent Publication No. JP 10-079337 A, Japanese Patent Office, Patent & Utility Model Gazette DB, 1 page (1998).
English Language Abstract for Japanese Patent Publication No. JP 2000-021722 A, Japanese Patent Office, Patent & Utility Model Gazette DB, 1 page (2000).
English Language Abstract for Japanese Patent Publication No. JP 2001-250761 A, Japanese Patent Office, Patent & Utility Model Gazette DB, 1 page (2001).
English Language Abstract for Japanese Patent Publication No. JP 2002-057081 A, Japanese Patent Office, Patent & Utility Model Gazette DB, 1 page (2002).
English Language Abstract for Japanese Patent Publication No. JP 2004-063988 A, Japanese Patent Office, Patent & Utility Model Gazette DB, 1 page (2004).
English Language Abstract for Japanese Patent Publication No. JP 2005-311020 A, Japanese Patent Office, Patent & Utility Model Gazette DB, 1 page (2005).
English Language Abstract for WIPO Patent Publication No. WO 2006/025408 Al, European Patent Office, espacenet database—Worldwide, 1 page (2006).
English translation of Notice of Reasons For Rejection directed to related Japanese Patent Application No. JP 2007-300017, mailed on Oct. 27, 2010 from the Japan Patent Office; 3 pages.
Jorritsma Laurentius Catrinus
Jungblut Reiner Maria
Loopstra Erik Roelof
Mulder Heine Melle
Sengers Timotheus Franciscus
ASML Netherlands B.V.
Nguyen Hung Henry
Sterne Kessler Goldstein & Fox P.L.L.C.
LandOfFree
Lithographic apparatus, device manufacturing method and... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Lithographic apparatus, device manufacturing method and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithographic apparatus, device manufacturing method and... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2757842