Lithographic apparatus and radiation source comprising a...

Photocopying – Projection printing and copying cameras – Step and repeat

Reexamination Certificate

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C355S067000, C355S077000, C378S034000, C250S492100

Reexamination Certificate

active

10747613

ABSTRACT:
A lithographic apparatus is disclosed. The lithographic apparatus includes a radiation source that produces EUV radiation, an illumination system that provides a beam of the EUV radiation produced by the radiation source, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The radiation source includes a debris-mitigation system that mitigates debris particles which are formed during production of EUV radiation. The debris-mitigation system is configured to provide additional particles for interacting with the debris particles.

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International Search Report issued for PCT Patent Application No. PCT/NL2004/000921, dated Nov. 24, 2005.

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