Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Reexamination Certificate
2006-07-18
2006-07-18
Lee, John R. (Department: 2881)
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
C355S052000, C414S217000, C248S638000
Reexamination Certificate
active
07078708
ABSTRACT:
A lithographic apparatus includes an illumination system for providing a beam of radiation. The lithographic apparatus further includes: a support structure for supporting patterning device, the patterning device serving to impart the beam with a pattern in its cross-section; a substrate table for holding a substrate; and a projection system for projecting the patterned beam onto a target portion of the substrate. The lithographic apparatus includes a vacuum system in which at least the illumination system and the substrate table are present. The vacuum system includes at least two separate vacuum modules. A first vacuum module includes at least the projection system and/or the illumination system. A second vacuum module includes the substrate table. At least two of the vacuum modules are connected to each other via a closable connection.
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patent: 6333775 (2001-12-01), Haney et al.
patent: 6406245 (2002-06-01), Hasegawa et al.
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patent: 2004/0070740 (2004-04-01), Irie
Amhaouch Mustafa
Bartray Pertrus Rutgerus
Liebregts Paulus Martinus Maria
Meesters Tim Anton Johan
Van Engelen Angelo Alexander Michael
Hashmi Zia R.
Lee John R.
Pillsbury Winthrop Shaw & Pittman LLP
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