Lithographic apparatus and method of manufacturing a device...

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C355S052000, C414S217000, C248S638000

Reexamination Certificate

active

07078708

ABSTRACT:
A lithographic apparatus includes an illumination system for providing a beam of radiation. The lithographic apparatus further includes: a support structure for supporting patterning device, the patterning device serving to impart the beam with a pattern in its cross-section; a substrate table for holding a substrate; and a projection system for projecting the patterned beam onto a target portion of the substrate. The lithographic apparatus includes a vacuum system in which at least the illumination system and the substrate table are present. The vacuum system includes at least two separate vacuum modules. A first vacuum module includes at least the projection system and/or the illumination system. A second vacuum module includes the substrate table. At least two of the vacuum modules are connected to each other via a closable connection.

REFERENCES:
patent: 5746562 (1998-05-01), Hasegawa et al.
patent: 6333775 (2001-12-01), Haney et al.
patent: 6406245 (2002-06-01), Hasegawa et al.
patent: 6606145 (2003-08-01), Irie et al.
patent: 2004/0070740 (2004-04-01), Irie

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Lithographic apparatus and method of manufacturing a device... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Lithographic apparatus and method of manufacturing a device..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithographic apparatus and method of manufacturing a device... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3536678

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.