Lithographic apparatus and method

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

156643, 156345, 21912119, 21912168, 21912183, 356364, 356382, 356138, B44C 122, B23K 1500, G01J 400, G01B 1106

Patent

active

052098133

ABSTRACT:
A lithographic method and a lithographic apparatus ar disclosed in which the height of a silicon wafer making up an object of lithography is accurately measured. A lithographic apparatus such as an electron beam apparatus having a height-measuring instrument built therein is effectively used for forming a pattern on the order of submicrons.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Lithographic apparatus and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Lithographic apparatus and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithographic apparatus and method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1347807

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.