Lithographic apparatus and device manufacturing method

Details Lithographic apparatus and device manufacturing method Lithographic apparatus and device manufacturing method

2004-07-13

2009-08-11

Toatley, Jr., Gregory J (Department: 2877)

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

C356S620000, C355S053000, C430S022000, C430S030000

Reexamination Certificate

active

07573574

ABSTRACT:
A lithographic apparatus and method comprise an illumination system arranged to provide a radiation beam, a support structure configured to support a product patterning device and a metrology target patterning device. The product patterning device imparts a radiation beam derived from the illumination system with a product pattern in its cross-section representing features of a product device to be formed. The metrology target patterning device imparts the radiation beam with a metrology target pattern in its cross-section representing at least one metrology target. The product patterning device is separate from the metrology target patterning device. A substrate table holds a substrate. A projection system project the radiation patterned by the product patterning device and the metrology target patterning device onto a target portion of the substrate. A metrology target patterning device controller adjusts the metrology target pattern independently of the product pattern.

REFERENCES:
patent: 5229872 (1993-07-01), Mumola
patent: 5296891 (1994-03-01), Vogt et al.
patent: 5500736 (1996-03-01), Koitabashi et al.
patent: 5523193 (1996-06-01), Nelson
patent: 5530482 (1996-06-01), Gove et al.
patent: 5579147 (1996-11-01), Mori et al.
patent: 5627624 (1997-05-01), Yim et al.
patent: 5656182 (1997-08-01), Marchman et al.
patent: 5677703 (1997-10-01), Bhuva et al.
patent: 5808797 (1998-09-01), Bloom et al.
patent: 5982553 (1999-11-01), Bloom et al.
patent: 6133986 (2000-10-01), Johnson
patent: 6177980 (2001-01-01), Johnson
patent: 6239858 (2001-05-01), Tomimatu
patent: 6251550 (2001-06-01), Ishikawa
patent: 6473157 (2002-10-01), Nakahara
patent: 6687041 (2004-02-01), Sandstrom
patent: 6732004 (2004-05-01), Mos et al.
patent: 6747783 (2004-06-01), Sandstrom
patent: 6795169 (2004-09-01), Tanaka et al.
patent: 6806897 (2004-10-01), Kataoka et al.
patent: 6811953 (2004-11-01), Hatada et al.
patent: 6832045 (2004-12-01), Nakaya et al.
patent: 6869739 (2005-03-01), Ausschnitt et al.
patent: 6936385 (2005-08-01), Lof et al.
patent: 6937318 (2005-08-01), Van De Nieuwelaar
patent: 7049049 (2006-05-01), Fries
patent: 7075639 (2006-07-01), Adel et al.
patent: 7130049 (2006-10-01), Consolini et al.
patent: 2004/0013954 (2004-01-01), Gijsbertsen et al.
patent: 2004/0041104 (2004-03-01), Liebregts et al.
patent: 2004/0119970 (2004-06-01), Dusa et al.
patent: 2004/0130561 (2004-07-01), Jain
patent: 2005/0001572 (2005-01-01), Benchaib et al.
patent: 2005/0105071 (2005-05-01), Ishii
patent: 2005/0213806 (2005-09-01), Hanina et al.
patent: 2006/0012779 (2006-01-01), Hinnen et al.
patent: 1 482 375 (2004-12-01), None
patent: 2-278812 (1990-11-01), None
patent: WO 98/33096 (1998-07-01), None
patent: WO 98/38597 (1998-09-01), None
English Abstract of Japanese Patent Pub. 2-278812, published Nov. 15, 1990, 1 pg.
Office Action, Japanese Patent Appln. 2005-202636, mailed Oct. 7, 2008, 3 pgs.

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