Lithographic apparatus, and device manufacturing method

Radiant energy – Irradiation of objects or material

Reexamination Certificate

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Reexamination Certificate

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07928412

ABSTRACT:
A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.

REFERENCES:
patent: 6791665 (2004-09-01), Kurt et al.
patent: 2002/0148975 (2002-10-01), Kimba et al.
patent: 2003/0155509 (2003-08-01), Nakasuji et al.
patent: 2004/0165160 (2004-08-01), Van Beek et al.
patent: 2004/0190677 (2004-09-01), Van Der Werf et al.
patent: 2006/0163500 (2006-07-01), Inoue et al.
patent: 2008/0083885 (2008-04-01), Van Herpen et al.
patent: 0 957 402 (1999-11-01), None
patent: 0 967 402 (1999-11-01), None
patent: 0 987 601 (2000-03-01), None
patent: 1 429 189 (2004-06-01), None
patent: WO 00/73823 (2000-12-01), None
patent: WO 2004/053540 (2004-06-01), None
patent: WO 2005/091076 (2005-09-01), None
International Search Report for International Application No. PCT/NL2007/050469 mailed Jan. 15, 2009, 5 pgs.

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