Lithographic apparatus and device manufacturing method

Optics: measuring and testing – By alignment in lateral direction

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C355S053000, C355S072000, C355S075000

Reexamination Certificate

active

07602489

ABSTRACT:
A lithographic apparatus includes a displacement measuring system to measure a position of a moveable object with respect to a reference frame of the lithographic apparatus, in at least three coplanar degrees of freedom (x, y, Rz) of an orthogonal x-y-z coordinate system centered in the center of the moveable object. The moveable object includes a support structure configured to support a patterning device or a substrate table configured to support a substrate. The displacement measuring system includes at least three sensor heads, each sensor head being positioned with a measuring direction substantially coplanar with the x-y plane of the coordinate system and each sensor head being furthermore positioned with the measuring direction substantially perpendicular to a connection line connecting the sensor head with the center of the movable object and extending coplanar with the x-y plane.

REFERENCES:
patent: 5610715 (1997-03-01), Yoshii et al.
patent: 2004/0263846 (2004-12-01), Kwan
patent: 2005/0168714 (2005-08-01), Renkens et al.
patent: 2006/0023178 (2006-02-01), Loopstra et al.
patent: 2006/0023194 (2006-02-01), Loopstra et al.
patent: 2006/0227309 (2006-10-01), Loopstra et al.
patent: 1111472 (2001-06-01), None
patent: 1621933 (2006-02-01), None
patent: 1762897 (2007-03-01), None
patent: 1826615 (2007-08-01), None
Mark L. Schattenburg and Henry I. Smith,“The critical role of metrology in nanotechnology”, 2002, Proc. SPIE 4608, 116.
J. Gargas, R. Dorval, D. Mansur, H. Tran, D. Carlson, & M. Hercher.“A Versatile XY Stage with a Flexural Six-Degree-of-Freedom Fine Positioner,” Oct. 1995, Proc. of the 10th Annual Mtg. of the ASPE.
Schäffel et al., “Integrated Electrodynamic Multicoordinate Drives—Modern Components for Intelligent Motions”, Proceedings of: The American Society for Precision Engineering—Eleventh Annual Meeting, vol. 14, pp. 456-461 (1996).
Search Report and Written Opinion issued on Sep. 25, 2008 in Singapore Application No. 200701182-8.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Lithographic apparatus and device manufacturing method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Lithographic apparatus and device manufacturing method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithographic apparatus and device manufacturing method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4064262

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.