Lithographic apparatus and device manufacturing method

Photocopying – Projection printing and copying cameras – With temperature or foreign particle control

Reexamination Certificate

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C355S053000

Reexamination Certificate

active

07446849

ABSTRACT:
A lithographic apparatus is disclosed. The apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system includes a housing and a plurality of optical elements arranged in the housing. The apparatus also includes an inlet for feeding conditioned gas to the housing and a gas exhaust for exhausting the conditioned gas from the housing for providing a gas conditioned environment in the housing. At least one gate is provided for providing communication of the gas conditioned environment with ambient atmosphere. The gate is arranged to provide a predetermined leakage of the conditioned gas to the ambient atmosphere.

REFERENCES:
patent: 5701169 (1997-12-01), Yoshioka
patent: 6222610 (2001-04-01), Hagiwara et al.
patent: 6630985 (2003-10-01), Hase
patent: 6671033 (2003-12-01), Akagawa et al.

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