Lithographic apparatus and device manufacturing method

Details Lithographic apparatus and device manufacturing method Lithographic apparatus and device manufacturing method

2004-10-12

2008-10-07

Rutledge, Della J. (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000, C355S067000, C378S034000, C378S035000

Reexamination Certificate

active

07433015

ABSTRACT:
An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection system and the substrate. The tuner is arranged to adjust one or more properties of the liquid such as the shape, composition, refractive index and/or absorptivity as a function of space and/or time in order to change the imaging performance of the lithography apparatus.

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