Lithographic apparatus and device manufacturing method

Details Lithographic apparatus and device manufacturing method Lithographic apparatus and device manufacturing method

2008-03-25

2008-03-25

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000, C356S498000

Reexamination Certificate

active

10960788

ABSTRACT:
Embodiments of the invention include an interferometer measurement system in which at least one reflective surface is arranged such that, in use, the beam path of interferometer radiation of the interferometer measurement system incident on the at least one reflective surface has an offset angle in the range of from 0.1 to 10 milliradians with respect to the normal to the at least one reflective surface. In that way, the effect of spurious radiation on the interferometer measurement system produced within the interferometer measurement system may be suppressed. In another embodiment, a parallel-sided plate is used in an interferometer measurement system to obtain a signal dependent on the angle of a beam of radiation reflected from a mirror. In that way, the flatness of the mirror can be mapped. One surface of the plate is a beam-splitter and the opposite surface of the plate is a reflector.

REFERENCES:
patent: 4746216 (1988-05-01), Sommargren
patent: 5398112 (1995-03-01), Ai et al.
patent: 2001/0035959 (2001-11-01), Hill
patent: 2003/0020921 (2003-01-01), Hill
patent: 2003/0038947 (2003-02-01), Hill
patent: 2003/0053074 (2003-03-01), Hill
patent: 2003/0197870 (2003-10-01), Bagwell et al.
patent: 11-125503 (1999-11-01), None
patent: 2003-028609 (2003-01-01), None
patent: WO 03/019109 (2003-03-01), None
European Search Report completed Aug. 4, 2004.

Affiliated with

Also associated with

Rating

Lithographic apparatus and device manufacturing method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Lithographic apparatus and device manufacturing method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithographic apparatus and device manufacturing method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3915770