Lithographic apparatus and device manufacturing method

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C430S005000, C355S067000, C355S077000, C378S034000

Reexamination Certificate

active

10453889

ABSTRACT:
A multi-optical-layer optical element of a lithographic projection apparatus in which at least one optical layer is comprised of an alloy of Mo and Cr. That layer may form the outer most layer of a Mo/Si layer system with an optional protective outer coating of Ru. Furthermore, the multi-optical-layer optical element may be comprised of a plurality of interposed between Mo/Cr alloyed layers.

REFERENCES:
patent: 5216539 (1993-06-01), Boher et al.
patent: 5958605 (1999-09-01), Montcalm et al.
patent: 6134049 (2000-10-01), Spiller et al.
patent: 6160867 (2000-12-01), Murakami
patent: 2003/0222225 (2003-12-01), Shiraishi
patent: 0 632 294 (1995-01-01), None
patent: 0632294 (1995-01-01), None
patent: 1 065 532 (2001-01-01), None
patent: 1065532 (2001-01-01), None
patent: 1 065 532 (2003-03-01), None
patent: 55-120003 (1980-09-01), None
patent: 63-303037 (1988-12-01), None
patent: 3-247743 (1991-11-01), None
patent: WO 00/70373 (2000-11-01), None
Louis et al., “Enhancement of reflectivity of multilayer mirrors for soft x-ray projection lithography by temperature optimization and ion bombardment,”Microelectronic Engineering23:215-218 (1994).
Slaughter et al., “Structure and performance of Si/Mo multilayer mirrors for the extreme ultraviolet,”J. Appl. Phys. 76(4):2144-2156 (1994).
Slaughter et al., “Structure . . . extreme ultraviolet,” J. Appl. Phys. 76 (4), Aug. 15, 1994, pp. 2144-2156.
E. Louis et al., “Enhancement . . . bombardment,” Microelectric Eng. 23, 1994, pp. 215-218.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Lithographic apparatus and device manufacturing method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Lithographic apparatus and device manufacturing method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithographic apparatus and device manufacturing method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3914000

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.