Lithographic apparatus and device manufacturing method

Photocopying – Projection printing and copying cameras – With temperature or foreign particle control

Reexamination Certificate

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Details

C355S055000

Reexamination Certificate

active

11366803

ABSTRACT:
A lithographic apparatus includes a measurement system to measure the position and/or movement of a substrate support relative to a reference frame. The measurement system includes a target mounted to one of the substrate support and the reference frame, a radiation source mounted to the other one of the substrate support and the reference frame and a sensor configured to detect a pattern of radiation propagating from the target, indicating the position or movement of the substrate support. The substrate support includes one or more gas outlets configured to provide a flow of gas that encapsulates the volume of space through which the beam of radiation propagates to the target.

REFERENCES:
patent: 6208407 (2001-03-01), Loopstra
patent: 6630984 (2003-10-01), Bisschops
patent: 6690450 (2004-02-01), Nishi

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