Lithographic apparatus and device manufacturing method

Details Lithographic apparatus and device manufacturing method Lithographic apparatus and device manufacturing method

2007-10-09

2007-10-09

Wells, Nikita (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S50400H, C204S192200, C430S005000, C427S596000

Reexamination Certificate

active

11094490

ABSTRACT:
A lithographic apparatus is arranged to project a beam from a radiation source onto a substrate. The apparatus includes an optical element in a path of the beam, a gas inlet for introducing a gas into the path of the beam so that the gas will be ionized by the beam to create electric fields toward the optical element, and a gas source coupled to the gas inlet for supplying the gas. The gas has a threshold of kinetic energy for sputtering the optical element that is greater than the kinetic energy developed by ions of the gas in the electric fields.

REFERENCES:
patent: 2006/0131515 (2006-06-01), Partlo et al.
patent: 1 491 963 (2004-12-01), None
patent: 1 491 963 (2005-08-01), None

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