Lithographic apparatus and device manufacturing method

Details Lithographic apparatus and device manufacturing method Lithographic apparatus and device manufacturing method

2007-01-30

2007-01-30

Rutledge, D. (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S071000, C378S034000, C250S492200

Reexamination Certificate

active

11335681

ABSTRACT:
A lithographic apparatus includes an illumination system configured to provide a beam of radiation, a support configured to support a patterning device, a substrate table and a projection system. Furthermore, the lithographic apparatus includes a plurality of EUV sources for providing EUV radiation to the illumination system and a distributor which is arranged to convert the EUV radiation from each of the EUV sources into an intermediate beam of radiation. The intermediate beam of radiation is directed from the distributor in a first direction by a mirror surface. The distributor may include a rotationally driven mirror arrangement, the axis of rotation being non-parallel to the mirror surface.

REFERENCES:
patent: 6597430 (2003-07-01), Nishi et al.
patent: 2003/0223544 (2003-12-01), Murakami

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