Lithographic apparatus and device manufacturing method

Details Lithographic apparatus and device manufacturing method Lithographic apparatus and device manufacturing method

2006-09-19

2006-09-19

Perkey, W. B. (Department: 2851)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S394000, C430S396000

Reexamination Certificate

active

07108960

ABSTRACT:
A sensor is used to detect luminescent radiation that is radiated from a reflector as a result of state changes induced by a beam of radiation being incident on an area of the reflector. The intensity of the luminescent radiation at particular wavelengths can be used to determine the intensity of the beam of radiation.

REFERENCES:
patent: 4929083 (1990-05-01), Brunner
patent: 5081635 (1992-01-01), Wakabayashi et al.
patent: 6359678 (2002-03-01), Ota
patent: 2002/0109103 (2002-08-01), Mulkens et al.
patent: 2005/0110965 (2005-05-01), Hendriks et al.
patent: 1 235 114 (2002-08-01), None
patent: 1235114 (2002-08-01), None
patent: 6-20925 (1994-01-01), None
patent: 62204527 (1997-09-01), None
patent: 11-26375 (1999-01-01), None
patent: 11-251239 (1999-09-01), None
T. Ito, Mask Exposure Apparatus, Sep. 9, 1987, Hitachi Ltd., JP 62 204527□□Patent Abstracts of Japan, vol. 012, No. 063 (E-585), Feb. 25, 1988.

Affiliated with

Also associated with

Rating

Lithographic apparatus and device manufacturing method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Lithographic apparatus and device manufacturing method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Lithographic apparatus and device manufacturing method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3617591